Intel Investor Meeting 2014 slide image

Intel Investor Meeting 2014

B 22 nm Process Interconnects B 7 14 nm Process 0 20070 00000 52 nm (0.65x) minimum pitch 80 nm minimum pitch 52 nm Interconnect Pitch Provides Better-than-normal Interconnect Scaling First Use of Air Gaps to Improve Interconnect Performance Source: Intel
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