ASML Reports €3.3 Billion Net Sales at 48.2% Gross Margin in Q2

DUV: Shipped first NXT:1470 system Provides >300 wph capability and <4.0 nm Matched Machine Overlay Building on the NXT immersion platform, with improved matched machine overlay and higher productivity to maximize wafer output from customers' cleanroom Reticle stage NXT:1970 RS with latest improvements New Wafer Stage Improved dynamics and enabling future scan speed increase Baseframe 4.0 support >325 wph Levelling UVLS MK2 with LIL New Wafer Handler Improved overlay by better thermal conditioning ASML PONY TWINSCAN NXT:1470 Projection optics Improved overlay distortion correction and prepared for high power lasers Heating control SW Better overlay control ASML Public Slide 8 July 15, 2020 Throughput Overlay control

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