KLA Investor Day Presentation Deck

Advanced Reticle Inspection Tools: Progress to Date 8xx Unique Die-to-Database Inspection Reference Target Difference 7xx On Schedule for High NA EUV 78 ** * Multiple 8xx e-beam systems shipped to address gap layers. ▪ Actinic EUV tool in development, intersecting with High NA EUV ■ ■ All reticle inspectors come with KLA's industry-standard die-to- database technology Semi PC R&D strategic investments ensure HVM capable products are available for customers at the right time KLAH Investor Day 53

View entire presentation