KLA Investor Day Presentation Deck

Complete EUV Qualification Solution TODAY FUTURE (N+1)* EUV SOLUTIONS DS MASK Optical Inspection for EUV EBEAM based Multi-Column m MASK SHOP ■ Extension of existing proven optical technology Complementary multi-column reticle inspection 34 KLA Non-Confidential | Unrestricted * Variability based on node transition timing. WAFER Implementing Gen5 EUV Extension WAFER FAB Wavelength: A : 190-260nm Algorithms: High Signal / Noise ▪ Leveraging Gen5 platform Unique wavelength range ▪ Custom algorithms Driving Intensity Growth through High End EUV Solutions KLA+

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